Patent name: Aqueous alkali-soluble resin, photosensitive resin composition, photomask and manufacturing method of electronic device. 2
Publication number: 1428358
Applicant: Hitachi, Ltd., Japan
The present invention provides a KrF excimer laser lithography photomask that can be manufactured with a small number of processes, with high accuracy and low defects. The KrF excimer photolithography method photomask of the present invention is a resist pattern in which a KrF excimer laser (wavelength of about 248 nm) is effectively absorbed directly on a quartz glass substrate. The resist pattern is composed of a photosensitive resin composition containing, as a main component, a highly light-shielding aqueous alkali-soluble resin to which at least one hydroxyl group is bonded to a naphthalene ring or a derivative of the aqueous alkali-soluble resin as an aqueous alkali-soluble resin of a polymer resin matrix. .
Source: Guangdong Printing
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