In the “Ninth Five-Year Plan†major scientific and technological research projects, 14 types of 18 key integrated circuit R&D equipments with a total investment of nearly RMB 130 million were recently approved by the Ministry of Information Industry in Chongqing for design and appraisal and project acceptance, and formally settled in China Electronics Technology Group Corporation. The 24th Institute. This project is required by the state for the development of 6-inch 0.5-micron analog integration R&D and domestic key special equipment development strategies.
The project mainly includes step projection lithography machine, rinse dryer, large beam ion implantation machine, electron beam exposure machine, low pressure chemical vapor deposition system, four tube oxidation diffusion system, metal reactive ion etching machine, and medium dry method. Etching machine, metal interlayer chemical vapor deposition system, magnetron sputtering system, silicon wafer processing system, silicon etching cleaning system, electron cyclotron resonance chemical vapor deposition system, quartz tube cleaning machine, etc. The 45th Research Institute of the Science and Technology Group, the 48th Research Institute, the State-owned 700 Factory, the 708 Factory, the 709 Factory, and the Xi'an University of Electronic Technology and other units.
The successful development of the special equipment for the project has, to a certain extent, reversed the low level of manufacturing of semiconductor process equipment in China, poor reliability, and the passive situation of relying mainly on imports. It has advanced the manufacturing level of China's core semiconductor process equipment by 5 to 8 years. In order to narrow the gap between China and the world’s advanced countries in the level of manufacturing of semiconductor process equipment, it has made outstanding contributions.
The project mainly includes step projection lithography machine, rinse dryer, large beam ion implantation machine, electron beam exposure machine, low pressure chemical vapor deposition system, four tube oxidation diffusion system, metal reactive ion etching machine, and medium dry method. Etching machine, metal interlayer chemical vapor deposition system, magnetron sputtering system, silicon wafer processing system, silicon etching cleaning system, electron cyclotron resonance chemical vapor deposition system, quartz tube cleaning machine, etc. The 45th Research Institute of the Science and Technology Group, the 48th Research Institute, the State-owned 700 Factory, the 708 Factory, the 709 Factory, and the Xi'an University of Electronic Technology and other units.
The successful development of the special equipment for the project has, to a certain extent, reversed the low level of manufacturing of semiconductor process equipment in China, poor reliability, and the passive situation of relying mainly on imports. It has advanced the manufacturing level of China's core semiconductor process equipment by 5 to 8 years. In order to narrow the gap between China and the world’s advanced countries in the level of manufacturing of semiconductor process equipment, it has made outstanding contributions.
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